MaskTrack Pro Series

Next-Generation Lithography for Photomask Clean, Bake and Develop

MaskTrack Pro solves next-generation lithography roadmap requirements for photomask cleaning, bake and developing. MaskTrack Pro is designed to balance the most stringent conditions of 193i 1x nm half-pitch (hp) DPT, extreme-ultraviolet lithography (EUVL) and nanomprint lithography (NIL) processing with innovative techniques to maximize mask performance.

With mask integrity playing a greater part in the success of advanced lithographic processing, MaskTrack Pro is the only platform that is specifically designed in respect to EUVL. It is extendable to allow tool clustering with third-party products for a holistic approach to storage, handling and processing of the mask in a fully-controlled and ultra-clean environment. Its modular platform guarantees maximum flexibility and customization. With its highest first pass cleaning yield, MaskTrack Pro has been accepted as the platform of choice in the industry.

Highlights

Improves time-to-market
Increases mask lifetime
Maximizes scanner uptime
Reduces cost-of-ownership
Maximizes yield

Details : Configuration: 193i / EUVL Photomask Cleaning System

MaskTrack Pro offers a unique combination of physical and chemical cleaning technologies and methods for surface preparation and passivation that enable customers to effectively remove particles, organic and inorganic contamination while preserving mask integrity down to 1x nm hp technology node. MaskTrack Pro is backward compatible to 90 nm hp.

Wet Cleaning
Surface Treatment
Process Automation
Standards

Configuration: Single Chamber Photomask Backside Cleaning System

MaskTrack Pro is configurable as an automated sulphate-free photomask cleaning system specifically designed for cleaning of pellicallized masks for advanced technology nodes.

Wet Cleaning
Process Automation
Standards

Configuration: InSync EUVL Photomask Management System

The MaskTrack Pro InSync system offers a specific solution for a holistic mask management in an EUVL environment. As an interface between the MaskTrack Pro cleaning tool and the EUV scanner, it enables automation of the EUV dual pod system. Providing an extremely high intrinsic cleanliness on environment and handling, it ensures a safe and contamination free transfer of the EUV mask the compatibility to the high sensitive vacuum environment of the EUV scanner. The innovative design allows inner pod stocking and backside particle detection with a third-party systems clustering.

Standards
Product Features

Configuration: Photomask Bake and Develop System

The MaskTrack Pro Bake/Develop system is part of SUSS's holistic mask product series for next-generation lithography. Designed for challenges of sub-32nm lithography the system enables most complex photomask manufacturing.

Process Automation
Standards
Developing
Post-Exposure Bake

Configuration: TeraPure Imprint Template Cleaning System

TeraPure, MaskTrack Pro’s specific system for imprint templates, is proven cleaning technology and SUSS’s industry-recognized highest first-pass cleaning yield. The modular design offers customers the flexibility needed for dynamic and developing technologies, such as nanoimprint lithography (NIL).