Spin Coaters / Spray Coaters
Meeting Your Needs with Comprehensive Coating/Developing Solutions
SUSS Spin Coaters / Spray Coaters have become synonymous with premium performance, ease of use, flexibility and enhanced coating mastery. With a complete line of compact and user-friendly spin coater / spray coater equipment from economic low-volume laboratory tools to high-end production coating up to 300mm SUSS MicroTec is the preferred choice for many microlithography process applications. SUSS Spin Coaters include the SUSS patented GYRSET system, a technique designed for solvent rich, low turbulence coating, that allows for minimal consumption of material. The newly launched Gamma XPress advanced coating cluster is targeting wafer bumping as well as LED manufacturing applications and is based on standardized production set-ups. Budgetary quotes for each of these configurations can be requested online. The SUSS proprietary developed AltaSpray Coating Technology uses a revolutionary resist deposition method that is mainly used for the fabrication of 3-D microstructures. AltaSpray enables conformal coatings across flat and steeply sloped surfaces, covering topography steps up to 600 microns and more.
Fab-automated Coating Cluster
ACS200Plus
wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
ACS300Plus
wafers: 200 and 300mm round, rectangular and square as option› read more...
Production Spin Coater / Spray Coater
Gamma
wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
Gamma AltaSpray
wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
Gamma XPress
wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
NEW!
Manual Spin & Spray Coaters
Delta 80RC
wafers: up to 8", substrates: up to 6"x6" › read more...
Delta AltaSpray
wafers: up to 8", substrates: up to 6"x6" › read more...
Delta 12RC
wafers: up to 12", substrates: up to 9"x9" › read more...


