Nanoimprint Lithography (NIL)
Micro-Nano Replication at its Best
Today, Aligned UV-Nanoimprint Lithography and Hot Embossing Lithography techniques offer a cost effective alternative to print sub-50 nm geometries compared with high resolution electron - or ion - beam lithography (EBL or IBL). Compared to EBL/IBL, those techniques provide higher throughput and avoid all damages on patterned structures during the process.
SUSS MicroTec offers cutting-edge technological solutions that caters to the economic requirements for both R&D and production needs, using Nanoimprint Technology.
NPS300
Nano imPrinting Stepper
Step&Stamp Imprint Lithography on Wafer: Hot Embossing Lithography & UV-NIL› read more...
MA6/8
Full-Field Imprint Lithography
at Chip and Wafer Level:
UV-NIL› read more...